Influence of Substrate Temperature on Structural and Morphological Properties of SnO2 Nanostructured Thin Films

D. C. VLADU; C. GHEORGHIES; M. BERCEA; I. STOICA; M. C. POPESCU; B. BITA; M. BORDEI

D. C. VLADU "Dunarea de Jos" University of Galati, Romania
C. GHEORGHIES "Dunarea de Jos" University of Galati, Romania
M. BERCEA U. T. Gh. Asachi Iasi, Romania
I. STOICA "Petru Poni" Institute of Macromolecular Chemistry Polymer Materials Physics, Romania
M. C. POPESCU National Institute for Research and Development in Microtechnologies IMT, Romania
B. BITA National Institute for Research and Development in Microtechnologies IMT, Romania
M. BORDEI "Dunarea de Jos" University of Galati, Romania

Keywords: electron beam-physical vapor deposition, structural, morphological properties, TEM, SEM, AFM

Abstract

SnO₂ nanostructures thin films with thickness of 500 nm were prepared by electron beam-physical vapor deposition on glass substrate at temperature of 300, 373, 443, and 583 K. Structural and morphological properties of these nanostructured thin films were studied by Scanning and Transmission Electron Microscopy (SEM, TEM) and Atomic Force Microscope (AFM) methods. The changes in structural and morphological properties are found at different temperatures. Increase temperature causes important change of the structural and morphological properties. The sample prepared at 300 K has crystalline structure and the sample prepared at 583 K has amorphous structure. Roughness parameters have low values at 300, 373, 443 K as opposed to the values obtained at 583 K. This different behavior may be due to the amorphous structure of the sample that was observed in the TEM analysis.

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Influence of Substrate Temperature on Structural and Morphological Properties of SnO2 Nanostructured Thin Films

Abstract

References

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