CuO Films Obtained by Oxidation of Cu Layers Deposited by the PVD Process - Magnetron Sputtering

  • Simona BOICIUC "Dunarea de Jos" University of Galati, Romania
Keywords: CuO thin films, d.c. magnetron, electrical and optical properties

Abstract

The experimental research carried out and described in this paper aimed to obtain thin films from copper oxides and their characterization from the structural point of view and the optical and electrical properties. To obtain the copper films, a PVD spray deposition system was used, consisting of a vacuum chamber with a capacity of 2 liters, a planar magnetron with ferrite magnets (40x22x9) neodymium (15x8), a vacuum pump with sliding blades, a variable source of direct current of voltage 100 - 600 volts. The atmosphere used for plasma maintenance during deposition was argon rarefied in a pressure range between 3·10-2 - 8·10-3 mbar. The deposits were made on glass plates. The films thus obtained were subsequently subjected to oxidation at temperatures of 200, 300 and 450 °C. It was found that the transparency of the films increases with the oxidation temperature from 1.464 * 10-4 for 200 ºC to 0.5 for 450 ºC and the surface electrical resistance also increases from 0.984 Ώ for 200 ºC to 3882857,1428 Ώ for 450 ºC. With increasing spray power, transparency and surface strength decrease.

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References

[1]. Kuz’menko A. B., van der Marel D., van Bentum P. J. M., Tishchenko E. A., Presura C., Bush A. A., Infrared spectroscopic study of CuO: Signatures of strong spin-phonon interaction and structural distortion, The American Physical Society, Physical Review B, vol. 63, 094303-1–094303-15, 2001.
[2]. Ogwu A. A., Darma T. H., Bouquerel E., Electrical resistivity of copper oxide thin films prepared by reactive magnetron sputtering, Journal of Achievements in Materials and Manufacturing Engineering, vol. 24, issue 1, September 2007.
[3]. Mech K., Kowalik R., Zabinski P., Cu thin films deposited by dc magnetron sputtering for contact surfaces on electronic components, Archives of metallurgy and materials, issue 4, 2011.
[4]. Cheng S. L., Chen M. F., Fabrication, characterization, and kinetic study of vertical single-crystalline CuO nanowires on Si substrates, Nanoscale Research Letters 7:119, p. 1-7, 2012.
[5]. Ali Gelali1, Azin Ahmadpourian, Shahoo Valedbagi, Behroz, Safibonab, Bandar Astinchap, Eisa Karimzadeh, Structure and Morphology of the Cu Films Grown by DC Magnetron Sputtering, Journal of Basic and Applied Scientific Research, November 2013.
[6]. Minh-Tung Le, Yong-Un Sohn, Jae-Won Lim, Good-Sun Choi, Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering, Materials Transactions, vol. 51, no. 1, p. 116-120, 2010.
[7]. Viorica Muşat, Filme subţiri multifuncţionale, Editura CERMI Iaşi, 20, p. 33-59, 2005.
[8]. Papadimitropoulos G., Vourdas N., Em Vamvakas V., Davazoglou D., Deposition and characterization of copper oxide thin films, Journal of Physics: Conference Series 10, 2005.
[9]. Figueiredo V., Elangovan E., Goncalves G., Barquinha P., Pereira L., Effect of post-annealing on the properties of copper oxide thin films obtained from the oxidation of evaporated metallic copper, Applied Surface Science, vol. 254, issue 13, Publisher: Elsevier Science BV, p. 3949-3954, 2008.
Published
2020-09-15
How to Cite
1.
BOICIUC S. CuO Films Obtained by Oxidation of Cu Layers Deposited by the PVD Process - Magnetron Sputtering. The Annals of “Dunarea de Jos” University of Galati. Fascicle IX, Metallurgy and Materials Science [Internet]. 15Sep.2020 [cited 15Jun.2024];43(3):15-0. Available from: https://www.gup.ugal.ro/ugaljournals/index.php/mms/article/view/3945
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